Etching Ring/Focusing Ring
Product Introduction
Improve clean etching environment, ensure etching accuracy and quality, used for wafer etching process
Applicable Equipment
Gen.3 Semiconductor Etch Equipment
Product Specifications
Substrate：CVD SiC（purity>6N）
Features：High Purity, corrosion resistance, high strength, stable chemical properties
Product Category
Dry Etch
Keywords
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Substrate：CVD SiC（purity>6N）
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Substrate：Si（purity>6N）
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Product Inquiry
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Service Hotline
Email: sales@lh-csm.com
Address: 204-013, Building Q01, Changsha Zhigu Industrial Park, No. 116, Huizhi North Road, Dongfanghong Street, Xiangjiang New Area, Changsha City, Hunan, China
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