8'' Wafer Lifting Block（TaC）
Product Introduction
As a component within the 8'' DR Wafer Supp, lifting wafers
Applicable Equipment
6''&8'' SiC Epitaxial Horizontal Reactors
Product Specifications
Substrate：Isostatic graphite（purity>6N）
Coating：TaC（thickness=30~50 μm）
Features：High compactness, high temperature and corrosion resistance(<2600℃), strong coating adhesion, long lifetime
Product Category
SiC Epitaxy
Keywords
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Product Inquiry
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Service Hotline
Email: sales@lh-csm.com
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